Patent Number: 6,294,630

Title: Polymers having dialkyl malonate groups and resist compositions containing the same for use in chemically amplified resists

Abstract: A polymer used in a chemically amplified resist is represented by the following formula: ##STR1## wherein R.sub.1, R.sub.3 and R.sub.5 are each independently selected from the group consisting of --H, and --CH.sub.3 ; R.sub.2 is selected from the group consisting of t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; R.sub.4 is selected from the group consisting of --H, --CH.sub.3, t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; x is an integer ranging from 1 to 4; and wherein l, m, and n are selected such that l/(l+m+n) ranges from 0.1 to 0.5, m/(l+m+n) ranges from 0.01 to 0.5, and (l+m)/(l+m+n) ranges from 0.1 to 0.7.

Inventors: Choi; Sang-jun (Seoul, KR)

Assignee: Samsung Electronics Co., Ltd.

International Classification: C08F 8/12 (20060101); C08F 212/00 (20060101); C08F 8/00 (20060101); C08F 212/14 (20060101); C08F 220/00 (20060101); C08F 220/28 (20060101); G03F 7/039 (20060101); C08F 008/12 (); C08F 220/28 (); C08L 033/00 ()

Expiration Date: 09/25/2018