Patent Number: 6,294,862

Title: Multi-cusp ion source

Abstract: An ion source (26) includes a plasma confinement chamber and a plasma electrode (70) forming a generally planar wall section of the plasma confinement chamber. The plasma electrode (70) has at least one opening (84, 86) for allowing an ion beam (88) to exit the confinement chamber and has a set of magnets (78, 80, 82) that generate a magnetic field extending across the openings (84, 86) in the plasma electrode (70). The openings (84, 86) in the plasma electrode (70) can be fashioned as elongated slots or circular openings aligned along the axis. The ion source (26) can further include a power supply (72) for negatively biasing the plasma electrode relative to the plasma confinement chamber and an insulator (74) for electrically insulating the plasma electrode (70). Cooling tubes can also be provided to transfer heat away from the magnets in the plasma electrode (70).

Inventors: Brailove; Adam A. (Gloucester, MA), Gwinn; Matthew Charles (Salem, MA)

Assignee: Eaton Corporation

International Classification: H01J 27/16 (20060101); H01J 27/18 (20060101); H01J 027/02 (); H01J 027/08 ()

Expiration Date: 09/25/2018