Patent Number: 6,295,118

Title: Optical arrangement for exposure apparatus

Abstract: An optical arrangement includes a diffractive optical element and a curvature control system for changing curvature of the diffractive optical element. The optical arrangement can be incorporated into an exposure apparatus having an illuminating system for illuminating a mask having a pattern formed thereon and a projecting system for projecting the pattern of the mask onto a wafer, such that the projecting system includes a diffractive optical element and a curvature control system for changing curvature of the diffractive optical element.

Inventors: Takeuchi; Seiji (Tucson, AZ)

Assignee: Canon Kabushiki Kaisha

International Classification: G03F 7/20 (20060101); G02B 5/18 (20060101); G03B 027/68 (); G03B 027/42 (); G03B 027/52 (); G03B 003/12 ()

Expiration Date: 09/25/2018