Patent Number: 6,295,119

Title: Scanning type exposure apparatus with multiple field diaphragms for providing consistent exposure

Abstract: A scanning exposure apparatus of the scan-and-stitch type for stitching and forming a plurality of pattern images while partially superimposing them on a photosensitive substrate along a direction perpendicular to a scanning direction. The apparatus includes a fixed field diaphragm for setting a width of an illumination area in the scanning direction on the mask, and a variable field diaphragm comprising third and fourth shielding plates for restricting the width of the illumination area in the scanning direction, and first and second shielding plates which are rotationally movable in a plane perpendicular to an optical axis of an illumination optical system for setting a width of the illumination area in the direction perpendicular to the scanning direction. Scanning exposure is performed while each of the first and second shielding plates maintains an identical rotational angle over a connecting area of an image-plane stitching section. Thus the same amount of exposure light is obtained on the connecting area and the other areas.

Inventors: Suzuki; Kazuaki (Kawasaki, JP)

Assignee: Nikon Corporation

International Classification: G03B 27/32 (20060101); G03F 7/20 (20060101); G03B 027/42 (); G03B 027/58 (); G03B 027/32 ()

Expiration Date: 09/25/2018