Patent Number: 6,295,121

Title: Exposure apparatus

Abstract: An exposure apparatus includes a light supplying device for supplying exposure light, an optical system for directing the exposure light to a substrate to be exposed, a cover for covering a predetermined portion of the optical system, a gas supply device for supplying an inert gas to the inside of the cover, a detector for detecting a quantity of the inert gas inside the cover and a controller for controlling the light supplying device on the basis of an output of the detector.

Inventors: Nakamura; Gen (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03F 7/20 (20060101); G03B 027/54 (); G03B 027/42 (); G03B 027/52 ()

Expiration Date: 09/25/2018