Patent Number: 6,295,122

Title: Illumination system and REMA objective with lens displacement and operating process therefor

Abstract: An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.

Inventors: Schultz; Jorg (Aalen, DE), Wangler; Johannes (Kongsbronn, DE)

Assignee: Zeiss; Carl

International Classification: G03F 7/20 (20060101); G03B 027/54 ()

Expiration Date: 09/25/2018