Patent Number: 6,297,468

Title: Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal

Abstract: The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber of an inductively coupled plasma reactor which processes a semiconductor wafer in the vacuum chamber, the reactor having a gas supply inlet for supplying processing gases into the vacuum chamber, the coil antenna including plural concentric spiral conductive windings, each of the windings having an interior end near an apex of a spiral of the winding and an outer end at a periphery of the spiral of the winding, and a common terminal connected to the interior ends of the plural concentric spiral windings, the RF power source being connected across the terminal and the outer end of each one of the windings.

Inventors: Qian; Xue-Yu (Milpitas, CA), Sato; Arthur H. (Santa Clara, CA)

Assignee: Applied Materials, Inc.

International Classification: H01J 37/32 (20060101); B23K 010/00 ()

Expiration Date: 10/02/2018