Patent Number: 6,297,512

Title: Double shield for electron and ion beam columns

Abstract: The column surrounding an electron or ion beam is shielded with a secondshield which is outside the column and isolated from the column, beingconnected to chassis ground at a location remote from the column. Also,wiring into the column is double shielded with the shields connected toground at the end remote from the column and not at the column itself.

Inventors: Czapski; Steven M. (Austin, TX)

Assignee:

International Classification:

Expiration Date: 10/02/2013