Patent Number: 6,297,516

Title: Method for deposition and patterning of organic thin film

Abstract: A patterning system with a photoresist overhang allows material to be deposited onto a substrate in various positions by varying the angle from which the material is deposited, and by rotating the substrate. The patterning system can be used to fabricate a stack of organic light emitting devices on a substrate using the same patterning system and without removing the substrate from vacuum.

Inventors: Forrest; Stephen R. (Princeton, NJ), Bulovic; Vladimir (Metuchen, NJ), Burrows; Paul (Princeton Junction, NJ)

Assignee: The Trustees of Princeton University

International Classification: H01L 27/28 (20060101); H01L 27/32 (20060101); H01L 51/50 (20060101); H01L 51/40 (20060101); H01L 51/05 (20060101); H01L 051/10 (); H01L 033/00 ()

Expiration Date: 10/02/2018