Patent Number: 6,297,517

Title: Semiconductor device and method of fabricating the same

Abstract: A semiconductor fabrication control monitor includes a first conductingfilm having a first area, a second area, a third area and a fourth areamutually connected, a first electrode, a second electrode, a thirdelectrode and a fourth electrode all formed on a semiconductor substrate.The first electrode is formed from a second conducting film formed abovethe first area with an insulating film sandwiched therebetween. The secondelectrode is formed from the second conducting film formed above thesecond area with the insulating film sandwiched therebetween. The thirdelectrode is formed from the second conducting film formed above and indirect contact with the third area. The fourth electrode is formed fromthe second conducting film formed above and in direct contact with thefourth area. The first electrode and the second electrode are mutuallyconnected through a connecting part of the second conducting film, and areelectrically connected to the first conducting film.

Inventors: Matsumoto; Michikazu (Kyoto, JP), Hirai; Takehiro (Shiga, JP)

Assignee:

International Classification:

Expiration Date: 10/02/2013