Patent Number: 6,299,511

Title: Chemical mechanical polishing conditioner

Abstract: A conditioner head uses a fluid purge system to prevent debris from entering openings in the conditioner head and causing deterioration of bearings and other moving components in the conditioner head. The fluid may be a gas, such as nitrogen, or a liquid, such as water or reactive solvents.

Inventors: Gurusamy; Jayakumar (Mountain View, CA), Rosenberg; Lawrence M. (San Jose, CA), Medvinsky; Alexander (Foster City, CA)

Assignee: Applied Materials, Inc.

International Classification: B24B 41/00 (20060101); B24B 53/007 (20060101); B24B 37/04 (20060101); B24B 41/04 (20060101); B24B 053/03 ()

Expiration Date: 10/09/2018