Patent Number: 6,305,097

Title: Apparatus for in-situ reticle cleaning at photolithography tool

Abstract: A system for cleaning a reticle. There is provided a clean chamber and a reticle having a pair of opposing edges and a pair of opposing surfaces which is to be cleaned disposed in the clean chamber. A gas inert to the reticle is directed in a direction tangential to each of the surfaces of the reticle and along one the edge of the reticle. The gas is exhausted from a location spaced from the other of the pair of opposing edges and remote form the one edge. An optional monitor monitors the particles in the exhausted gas. The gas is preferably applied in pulses which have a pulse length of from about 0.05 second to about 1 second and a pulse repetition rate of from about 0.5/second to about 40/second. The gas is preferably ionized and preferably is applied at a pressure of from about 20 psi to about 120 psi. The stepper chamber is vibrationally isolated from the blow-off chamber. Also, the controller for the cleaning operation is synchronized with the stepper operation to avoid cleaning while the stepper operation is ongoing.

Inventors: Salamati-Saradh; Sima (Plano, TX), Guldi; Richard L. (Dallas, TX), Wyke; David R. (McKinney, TX)

Assignee: Texas Instruments Incorporated

International Classification: G03F 7/20 (20060101); H01L 21/00 (20060101); F26B 025/00 ()

Expiration Date: 10/23/2018