Patent Number: 6,305,315

Title: ECR plasma apparatus

Abstract: An ECR plasma apparatus is formed of a vacuum chamber, a cavity disposed at a side surface of the vacuum chamber to which microwave is introduced, an electromagnetic coil disposed around the cavity, and a case member made of a conductive material having the same electric potential as that of the cavity. The case member is disposed in the vacuum chamber adjacent the cavity to supplement resonance operation in the cavity. Thus, the cavity and the electromagnetic coil disposed therearound can be miniaturized and lightened in weight.

Inventors: Suzuki; Masayasu (Emsworth, GB), Ishii; Satoko (Hatano, JP)

Assignee: Shimadzu Corporation

International Classification: C23C 16/50 (20060101); C23C 16/511 (20060101); H01J 37/32 (20060101); C23C 016/00 (); H05H 001/00 ()

Expiration Date: 10/23/2018