Patent Number: 6,305,390

Title: Method for cleaning inside of chamber using RF plasma

Abstract: A method for cleaning the inside of a chamber using a radio frequency (RF) plasma, in which all parts within the camber can be completely cleaned. In the cleaning method, the conditions inside the chamber are stabilized. Then, impurities are cleaned from the inside of the chamber using the RF plasma, while varying the pressure in the chamber continuously or in discrete steps.

Inventors: Jeon; Jin-ho (Austin, TX)

Assignee: Samsung Electronics Co., Ltd.

International Classification: C23C 16/44 (20060101); H01J 37/32 (20060101); H01L 21/02 (20060101); H01L 21/285 (20060101); B08B 006/00 ()

Expiration Date: 10/23/2018