Patent Number: 6,309,465

Title: CVD reactor

Abstract: A CVD reactor comprising: a reactor casing with a casing cover, a heated susceptor for one wafer or several wafers, which is disposed in the reactor casing, a fluid inlet unit including a plurality of openings facing said wafer or wafers through which the CVD media, which is moderately heated, enter the reactor, and a fluid outlet disposed on the periphery of the reactor casing, through which the introduced media is discharged; wherein the fluid outlet has roughly the shape of a disk with a plurality of outlet openings for the discharge of CVD media, and is disposed between the susceptor and the reactor cover in such a way that the fluid outlet is heated by the susceptor by radiation and hence adjusts itself to a temperature between the temperature of the susceptor and the reactor cover through which the CVD media enter in a moderately heated state.

Inventors: Jurgensen; Holger (Rathausstrasse, DE), Deschler; Marc (Schlottfelder, DE), Strauch; Gerd (Schonauer, DE), Schumacher; Markus (Grosse Rur Strasse, DE), Kappeler; Johannes (Zeisigweg, DE)

Assignee: Aixtron AG.

International Classification: C23C 16/44 (20060101); C23C 16/455 (20060101); C23C 016/00 ()

Expiration Date: 10/30/2018