Patent Number: 6,309,467

Title: Method for producing a semiconductor material

Abstract: Semiconductor material has a low metal concentration at the surface. The semiconductor material has an iron content and/or chromium content on the surface of less than 6.66.times.10.sup.-11 g/cm.sup.2. A method for producing this semiconductor material includes a preliminary cleaning, a main cleaning and hydrophilization. A device for use in this method has a container with pyramid-shaped recesses at the bottom.

Inventors: Wochner; Hanns (Burghausen, DE), Bauer; Theresia (Burgkirchen, DE), Dietl; Josef (Neuotting, DE), Ott; Werner (Tann, DE), Pichler; Herbert (Ach, AT), Schmidbauer; Wilhelm (Emmerting, DE), Seifert; Dieter (Neuotting, DE), Weizbauer; Susanne (Rosenheim, DE)

Assignee: Wacker-Chemie GmbH

International Classification: C01B 33/00 (20060101); C01B 33/037 (20060101); H01L 21/02 (20060101); H01L 21/306 (20060101); C23G 001/02 (); B08B 003/08 ()

Expiration Date: 10/30/2018