Patent Number: 6,309,529

Title: Method for producing sputtering target material

Abstract: The invention provides a method for producing a sputtering target material including electrolyzing a molten salt mixture containing a precious metal salt and a solvent salt, to thereby deposit a precious metal or a precious metal alloy. The method enables simplification of production steps and produces high-purity target materials. In addition, the electrodeposited precious metal or precious metal alloy is heat-treated at a temperature of at least C. but lower than the melting point of the precious metal, to thereby produce a target material of higher purity.

Inventors: Hara; Noriaki (Kanagawa-ken, JP), Yarita; Somei (Kanagawa-ken, JP), Hagiwara; Ken (Kanagawa-ken, JP), Matsuzaka; Ritsuya (Kanagawa-ken, JP)

Assignee: Tanaka Kikinozoku Kogyo K.K.

International Classification: C23C 14/34 (20060101); C25D 3/00 (20060101); C25D 3/66 (20060101); C25D 5/48 (20060101); C25D 5/50 (20060101); C25C 003/00 ()

Expiration Date: 10/30/2018