Patent Number: 6,309,556

Title: Method of manufacturing enhanced finish sputtering targets

Abstract: A method is provided for achieving an enhanced finish on a sputter target surface that results in good film uniformity, low particle counts, and little to no bum-in time. The method involves chemically etching the surface of the sputter target by immersing the surface one or more times in an etching solution, with intermediate rinsing steps. The result is a surface substantially free of mechanical deformation that exhibits a surface similar to a sputtered target with a surface roughness of 10-30

Inventors: Joyce; James Elliot (Bedford, NY), Hunt; Thomas John (Peekskill, NY), Gilman; Paul Sandford (Suffenn, NY)

Assignee: Praxair S.T. Technology, Inc.

International Classification: C23F 3/00 (20060101); C23C 014/14 ()

Expiration Date: 10/30/2018