Patent Number: 6,309,691

Title: Method of manufacturing electron-emitting device, electron source and image-forming apparatus

Abstract: An electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes is manufactured. The electroconductive film is formed by applying a liquid containing the material of the film to a substrate by using an ink-jet method, then drying and heating the applied liquid. Defective conditions, if any, in the applied liquid or the precursor film formed by drying the liquid or the electroconductive film formed by heating the precursor film are detected and remedied by applying the same liquid again to the area detected for a defective condition. The detection and remedy of any defective condition may be conducted after the liquid-applying, drying or baking step.

Inventors: Hasegawa; Mitsutoshi (Yokohama, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: H01J 9/02 (20060101); B05D 005/12 ()

Expiration Date: 10/30/2018