Patent Number: 6,309,705

Title: Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings

Abstract: A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

Inventors: Montcalm; Claude (Livermore, CA), Mirkarimi; Paul B. (Sunol, CA)

Assignee: The Regents of the University of California

International Classification: C03C 17/36 (20060101); G02B 1/10 (20060101); G03F 7/20 (20060101); B05D 003/02 (); B05D 001/36 (); B05D 005/06 ()

Expiration Date: 10/30/2018