Patent Number: 6,309,789

Title: Composition for reflection reducing coating

Abstract: The anti-reflective coating composition comprising at least perfluoroalkylsulfonic acid (A) represented by the general formula: C.sub.n F.sub.2n+1 SO.sub.3 H (n is an integer of 4 to 8), organic amine (B), water-soluble polymer (C), perfluoroalkyl sulfonamide (D) represented by the general formula: C.sub.n F.sub.2n+1 SO.sub.2 NH.sub.2 (n is an integer of 1 to 8) and water (E) and having a pH value of 1.3 to 3.3 is applied onto a photoresist film formed on a substrate, thus forming an anti-reflective coating. The photoresist and anti-reflective coating are then exposed to light and developed to give a resist pattern. The coating composition can form a uniform anti-reflective coating free of standing wave, multiple reflection, T-top and PED (Post Exposure Delay) in a small amount of drip onto any types of resists regardless of the surface shape of a substrate.

Inventors: Takano; Yusuke (Shizuoka, JP), Tanaka; Hatsuyuki (Shizuoka, JP), Takano; Kiyofumi (Osaka, JP), Hashimoto; Yutaka (Osaka, JP)

Assignee: Clariant Finance (BVI) Limited

International Classification: C09D 5/00 (20060101); G03F 7/09 (20060101); G03F 007/004 ()

Expiration Date: 10/30/2018