Patent Number: 6,309,793

Title: Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations

Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.

Inventors: Malik; Sanjay (Attleboro, MA), Blakeney; Andrew J. (Seekonk, MA), Ferreira; Lawrence (Fall River, MA), Sizensky; Joseph J. (Seekonk, MA), Maxwell; Brian E. (Rumford, RI)

Assignee: Arch Specialty Chemicals, Inc.

International Classification: C08F 257/00 (20060101); C08F 261/02 (20060101); C08F 261/00 (20060101); C08F 257/02 (20060101); C08F 261/12 (20060101); G03F 7/004 (20060101); G03F 7/039 (20060101); G03F 007/039 (); G03F 007/004 ()

Expiration Date: 10/30/2018