Patent Number: 6,309,804

Title: Reducing contamination induced scumming, for semiconductor device, by acid treatment

Abstract: A semiconductor device is manufactured using an acid treatment process to eliminate the adverse effects of contamination, such as amine-airborne contamination. Consistent with one embodiment of the present invention, the semiconductor device is formed by applying a DUV-type photoresist over the wafer surface, exposing the photoresist to DUV light, treating the exposed photoresist with an acid vapor, and thereafter baking the exposed wafer.

Inventors: Ziger; David (San Antonio, TX), Robinett; Christopher (San Antonio, TX)

Assignee: Philips Semiconductor, Inc.

International Classification: G03F 7/38 (20060101); G03F 7/26 (20060101); G03F 7/004 (20060101); G03F 007/00 ()

Expiration Date: 10/30/2018