Patent Number: 6,309,906

Title: Photovoltaic cell and method of producing that cell

Abstract: The device (10) comprises a deposition chamber (12) containing two electrodes (13, 14), one of which comprises a support (16) for a substrate (17) and is earthed, the other being connected to an electric radio frequency generator (15). The device includes a mechanism (23) for extracting gas from the chamber (12) and a mechanism (18) for supplying gas. The device also comprises a mechanism for purification (31) of the gases introduced into the chamber, these a mechanism being arranged so as to reduce the number of oxygen atoms contained in the deposition gas, such gas being made up of silane, hydrogen and/or argon. The procedure consists of creating a vacuum in the deposition chamber (12), purifying the gases using purification a mechanism (31), introducing these purified gases into the chamber (12), then creating a plasma between the electrodes (13, 14). A film of intrinsic microcrystalline silicon in then deposited on the substrate.

Inventors: Meier; Johann (Corcelles, CH), Kroll; Ulrich (Corcelles, CH)

Assignee: Universite de Neuchatel-Institut de Microtechnique

International Classification: H01L 21/02 (20060101); H01L 21/205 (20060101); H01L 29/66 (20060101); H01L 29/786 (20060101); H01L 31/06 (20060101); H01L 31/0352 (20060101); H01L 31/075 (20060101); H01L 31/0248 (20060101); H01L 31/20 (20060101); H01L 31/18 (20060101); H01L 031/20 (); H01L 031/075 (); H01L 021/00 ()

Expiration Date: 10/30/2018