Patent Number: 6,309,991

Title: Silica with low compaction under high energy irradiation

Abstract: Fused silica stepper lens for photolithographic application are disclosedwhich are resistant to laser-induced damage, specifically, compaction ordensification which can lead to an increase in the optical path length ofthe lens. The figure compares the phase front distortions of a standardfused silica with the phase front distortions observed in two inventivestepper lens fused silica.

Inventors: Borrelli; Nicholas F. (Elmira, NY), Seward, III; Thomas P. (Elmira, NY), Smith; Charlene (Corning, NY)


International Classification:

Expiration Date: 10/32013