Patent Number: 6,310,168

Title: Aminated polysilazane and process for the preparation thereof

Abstract: An amine residue-containing polysilazane having a number average molecular weight of 100-100,000 and having a molecular chain containing a silazane structure represented by the general formula (I) shown below and/or a silazane structure represented by the general formula (II) shown below: ##STR1## wherein R.sup.1 and R.sup.2 each stand for hydrogen, a hydrocarbyl group or a hydrocarbyl group-containing silyl group, A and A.sup.2 each stand for a divalent hydrocarbyl group, B stands for an N-hydrocarbyl group-substituted amine residue or a cyclic amine residue, B.sup.2 stands for a divalent linear amine residue or a divalent cyclic amine residue and p, r and q are each 0 or 1. The above polysilazane may be obtained by reacting a polysilazane with a mono- and/or dihydroxyl compound having an amine residue in an inert organic solvent containing no active hydrogen.

Inventors: Shimizu; Yasuo (Saitama-ken, JP), Aoki; Tomoko (Saitama-ken, JP), Funayama; Osamu (Saitama-ken, JP)

Assignee: Tonen Corporation

International Classification: C08G 77/00 (20060101); C08G 77/54 (20060101); C08G 77/62 (20060101); C08G 077/62 (); C07F 007/10 ()

Expiration Date: 10/30/2018