Patent Number: 6,310,356

Title: Fluid fine particle measuring system for processing semiconductors

Abstract: A fine particle measuring system for semiconductor cleaning fluid includes a sample tank for holding a sample of the cleaning fluid and a pump that can circulate the sample of cleaning fluid. A return conduit is connected to a filter and a bubble discharge opening member to return a major portion of the sample of cleaning fluid to the sample tank. A minor portion of the cleaning fluid is directed respectively to a cooling unit, and then to a deaerator for eliminating any effects of bubbles on the measurement of fine particles in the cleaning fluid. A first conduit is connected to a measuring cell to return the sample cleaning fluid to the sample tank while a second conduit is connected to the deaerator to draw gas from the bubbles that have been separated from the deaerator.

Inventors: Yuhara; Yoshihito (Miyanohigashi-machi, JP), Suzuki; Riichiro (Miyanohigashi-machi, JP)

Assignee: Horiba, Ltd.

International Classification: B01D 19/00 (20060101); G01N 15/02 (20060101); G01N 015/14 (); G01B 011/00 ()

Expiration Date: 10/30/2018