Patent Number: 6,310,375

Title: Trench capacitor with isolation collar and corresponding manufacturing method

Abstract: The present invention provides a trench capacitor, particularly for use in a semiconductor memory cell (100), having an isolation collar (168) with a trench (108) formed in a substrate (101); said isolation collar (168) formed in the upper region of said trench (108); an optional buried plate (165) in said substrate region surrounding said lower region of said trench (180) as a first capacitor plate; a dielectric layer (164) for lining said lower region of said trench (108) and said isolation collar (168) as capacitor dielectric; and a conductive second fill material (161) filled in said trench (108) as a second capacitor plate; wherein said diameter of said lower region of said trench (108) is at least equal to said diameter of said upper region of said trench (108). Moreover, the invention provides a corresponding manufacturing method.

Inventors: Schrems; Martin (Langebrueck, DE)

Assignee: Siemens Aktiengesellschaft

International Classification: H01L 21/70 (20060101); H01L 21/8242 (20060101); H01L 027/108 ()

Expiration Date: 10/30/2018