Patent Number: 6,310,577

Title: Plasma processing system with a new inductive antenna and hybrid coupling of electronagnetic power

Abstract: An antenna adapted to apply a uniform electromagnetic field with high energy density to a volume of gas. The antenna includes an input node for receiving electrical energy and a first coil for radiating electromagnetic energy into the gas. The first coil is connected to the input node on one end thereof and is grounded on the opposite side to cause flux to flow in a first direction. A second coil is included for radiating electromagnetic energy into the gas. The second coil is also connected to the input node on one end thereof and grounded on the opposite side to flow in the first direction. Multiple number of coils can be added to form an antenna. In an illustrative application, the antenna is used in a plasma processing system comprising a vacuum chamber, a gas disposed within the vacuum chamber, and a dielectric disposed around the vacuum chamber. The inventive antenna is mounted around the dielectric tube and radiates electromagnetic energy into the gas. In a specific embodiment, the invention further includes a magnet disposed about the chamber in proximity to the antenna. When RF power is supplied to the antenna via an impedance matching network, the antenna radiates a uniform, dense electromagnetic wave into the gas creating plasma. The invention includes an electrically isolated electrode located on top of the source. When (RF) power is supplied to the electrode via on impedance matching network, the electrode creates an electrostatic force that pushes electrons back into plasma there by resulting in high plasma density.

Inventors: Ra; Yunju (Placentia, CA)

Assignee: Bethel Material Research

International Classification: H01J 37/32 (20060101); H05B 6/62 (20060101); H05B 6/00 (20060101); H05H 1/46 (20060101); H05B 6/10 (20060101); H01Q 001/26 ()

Expiration Date: 10/30/2018