Patent Number: 6,310,755

Title: Electrostatic chuck having gas cavity and method

Abstract: An electrostatic chuck 55 has an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive the substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. A support 190 below the electrostatic member 100 has a cavity 300 adapted to hold a gas to serve as a thermal insulator to regulate the flow of heat from the electrostatic chuck 55 to a surface 120 of the chamber 25. The cavity 300 has a cross-sectional profile that is shaped to provide a predetermined temperature profile across the substrate 30.

Inventors: Kholodenko; Arnold (San Francisco, CA), Shamouilian; Shamouil (San Jose, CA), Wang; You (Cupertino, CA), Cheng; Wing L. (Sunnyvale, CA), Veytser; Alexander M. (Mountain View, CA), Bedi; Surinder S. (Fremont, CA), Narendrnath; Kadthala R. (San Jose, CA), Kats; Semyon L. (San Francisco, CA), Grimard; Dennis S. (Ann Arbor, CA), Kumar; Ananda H. (Milpitas, CA)

Assignee: Applied Materials, Inc.

International Classification: H01L 21/683 (20060101); H01L 21/67 (20060101); H01L 21/00 (20060101); H01G 023/00 ()

Expiration Date: 10/30/2018