Patent Number: 6,310,934

Title: X-ray projection exposure apparatus and a device manufacturing method

Abstract: An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.

Inventors: Hara; Shinichi (Kitakawabe-machi, JP), Tsukamoto; Masami (Yokohama, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03F 7/20 (20060101); G21K 5/10 (20060101); G21K 005/00 ()

Expiration Date: 10/30/2018