Patent Number: 6,310,937

Title: X-ray diffraction apparatus with an x-ray optical reference channel

Abstract: X-ray diffraction measurements are often carried out in a given atmosphere which may vary in respect of a variety of parameters, such as pressure, temperature, etc. Notably soft X-rays are very sensitive to atmospheric absorption. Therefore, the measured intensity is dependent not only on the material variables to be measured for the sample to be examined (10), but also on the varying absorption which thus constitutes a disturbing influencing of the X-rays in the X-ray optical path (16, 46, 50, 10, 52) from the X-ray source (7) to the detector (30). According to the invention a second X-ray optical path (54, 56, 58, 60) is established; this second path deviates from the first X-ray optical path and serves to carry out reference measurements, during or between the actual measurements, in order to determine the absorption of the atmosphere and to determine a correction factor for the X-ray intensity measured during the actual measurements.

Inventors: Van Den Hoogenhof; Waltherus W. (Almelo, NL)

Assignee: U.S. Philips Corporation

International Classification: G01N 23/20 (20060101); G01N 023/20 ()

Expiration Date: 10/30/2018