Patent Number: 6,332,348

Title: Gas flow calibration of mass flow controllers

Abstract: A method, system, and storage medium for gas flow calibration of mass flow controllers (MFCs) is presented. A second mass flow controller that has a full scale range substantially less than that of a mass flow meter (MFM) may be calibrated by the MFM using a ""gas biasing"" technique. A first MFC is set such that a first flow of gas through the MFM at a first flow rate results. The first flow rate is preferably approximately 50% of the full scale range of the MFM. A first reading of the MFM is then recorded. The second MFC is then set such that a second gas flow of gas through the MFM at a second flow rate results. A second reading of the MFM is then recorded. The difference between the second and first readings is then compared to the set flow rate of the second MFC to determine the calibration of the second MFC. The full scale range of the second MFC may be less than 1% of the full scale range of the MFM.

Inventors: Yelverton; Mark E. (Austin, TX), Timmons; Tom (Bastrop, TX)

Assignee: Advanced Micro Devices, Inc.

International Classification: G01F 25/00 (20060101); G01F 025/00 ()

Expiration Date: 12/25/2018