Patent Number: 6,332,924

Title: Photoresist dispensing device

Abstract: A photoresist dispensing device for use in applying a metered amount of photoresist on a wafer comprises, a photoresist storage tank, a nozzle for spraying the photoresist on the wafer, a feeder unit for drawing a metered amount of the photoresist out of the storage tank and discharging it through the nozzle, a pneumatic control unit for controlling the operation of the feeder unit with the use of pressurized air; and a filter disposed in between the storage tank and the feeder unit for removing alien matters present the photoresist. The feeder unit includes a base having an inlet port leading to the storage tank, an outlet port leading to the nozzle and first through third intermediate passageways interconnecting the inlet and outlet ports, a first cutoff valve mounted on the base at a position between the inlet port and the first intermediate passageway, a diaphragm pump attached to the base at a position between the first and second intermediate passageways, a second cutoff valve secured to the base at a position between the second and third intermediate passageways, and a suck-back valve affixed to the base at a position between the third intermediate passageway and the outlet port.

Inventors: Shim; Kyoung Sup (Kyonggi-do, KR), Kim; Jong Suk (Kyonggi-do, KR)

Assignee: Taeyang Tech Co., Ltd.

International Classification: F16K 23/00 (20060101); G03F 7/16 (20060101); B05C 11/08 (20060101); B05C 005/02 ()

Expiration Date: 12/25/2018