Patent Number: 6,332,927

Title: Substrate processing apparatus

Abstract: A substrate processing apparatus comprises a heating member, a reactiontube body provided in the heating member and having a first gasintroducing section and a gas exhausting section, a substrate holderdisposed in the reaction tube body for horizontally holding a substratewithin the reaction tube body between the first gas introducing sectionand the gas exhausting section, a gas heating tube provided in the heatingmember along the reaction tube body, and having a second gas introducingsection and a gas discharging section which is in communication with thefirst gas introducing section of the reaction tube body, the gas heatingtube being arranged such that a gas flowing in the gas heating tube firstflows form the first gas introducing section side toward the gasexhausting section side, and then returns to flow from the gas exhaustingsection side toward the first gas introducing section side.

Inventors: Inokuchi; Yasuhiro (Tokyo, JP), Ikeda; Fumihide (Tokyo, JP)

Assignee:

International Classification: C23C 16/455 (20060101); H01L 21/00 (20060101); C23C 16/44 (20060101); C23C 016/00 (); C23C 016/455 ()

Expiration Date: 12/25/2014