Patent Number: 6,480,324

Title: Methods involving direct write optical lithography

Abstract: An improved optical photolithography system and method providespredetermined light patterns generated by a direct write system withoutthe use of photomasks. The Direct Write System provides predeterminedlight patterns projected on the surface of a substrate (e.g., a wafer) byusing a computer controlled component for dynamically generating thepredetermined light pattern, e.g., a spatial light modulator. Imagepatterns are stored in a computer and through electronic control of thespatial light modulator directly illuminate the wafer to define a portionof the polymer array, rather than being defined by a pattern on aphotomask. Thus, in the Direct Write System each pixel is illuminated withan optical beam of suitable intensity and the imaging (printing) of anindividual feature is determined by computer control of the spatial lightmodulator at each photolithographic step without the use of a photomask.The Direct Write System including a spatial light modulator isparticularly useful in the synthesis of DNA arrays and provides anefficient element for polymer array synthesis by using spatial lightmodulators to generate a predetermined light pattern that defines theimage patterns of a polymer array to be deprotected.

Inventors: Quate; Calvin F. (Stanford, CA), Stern; David (Mountain View, CA)

Assignee:

International Classification: B01J 19/00 (20060101); G03F 7/20 (20060101); G02B 026/08 ()

Expiration Date: 11/12014