Patent Number: 6,569,251

Title: Detergent for lithography

Abstract: The present invention relates to a cleaner for lithography which is excellent in the ability to dissolve a resist and highly safe to the human body and which can be used usefully to clean a coater such as in a coater cup, to remove an unnecessary resist from a substrate when or after coating of a resist, to remove the resist from the substrate after the object using the resist was achieved, and to clean and rinse the substrate after removal of the resist. The cleaner for lithography comprises a homogeneous solution of at least one organic solvent selected from the group consisting of propylene glycol alkyl ether, propylene glycol alkyl ether acetate, ethylene glycol alkyl ether, ethylene glycol alkyl ether acetate, acetic acid alkyl ester, propionic acid alkyl ester, alkoxypropionic acid alkyl ester, lactic acid alkyl ester, aliphatic ketone, and alkoxybutanol and at least one selected from alcohols having alkyl group with 1 to 4 carbon atoms.

Inventors: Takeda; Takashi (Ogasa-gun, JP)

Assignee: Clariant Finance (BVI) Limited

International Classification: C11D 11/00 (20060101); C11D 7/22 (20060101); C11D 7/50 (20060101); C11D 7/26 (20060101); C11D 7/32 (20060101); G03F 7/42 (20060101); G03F 7/16 (20060101); H01L 21/02 (20060101); H01L 21/311 (20060101); C11D 003/44 (); C11D 003/20 (); C23G 001/24 ()

Expiration Date: 05/27/2020