Patent Number: 6,612,317

Title: Supercritical fluid delivery and recovery system for semiconductor wafer processing

Abstract: A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.

Inventors: Costantini; Michael A. (Hudson, NH), Chandra; Mohan (Merrimack, NH), Moritz; Heiko D. (Nashua, NH), Jafri; Ijaz H. (Nashua, NH), Mount; David J. (North Andover, MA), Heathwaite; Rick M. (Manchester, NH)

Assignee: S.C. Fluids, INC

International Classification: B01J 3/00 (20060101); B08B 7/00 (20060101); H01L 21/00 (20060101); B08B 003/10 ()

Expiration Date: 09/02/2020