Patent Number: 6,674,509

Title: Scanning exposure apparatus and method

Abstract: A scanning exposure apparatus for transferring a pattern of a master ontoeach of a plurality of shot regions defined on a substrate, whilesynchronously scanning the master and the substrate. The apparatusincludes a master stage for moving the master, a substrate stage formoving the substrate, and a controller for controlling movement of thesubstrate stage during scanning exposure of the plurality of shot regionsso as to assure that a setting distance in which the substrate stage ismoved guarantees that a synchronization error between the master stage andthe substrate stage falls within an allowable range after the substratestage is accelerated up to a scan speed for the scanning exposure. Thecontroller controls the movement of the substrate stage such that asetting distance for first shot region, which is exposed first upon achange in a row to which a shot region to be exposed belongs, is set to belonger than a setting distance for other shot regions.

Inventors: Suzuki; Toru (Tochigi, JP)


International Classification: G03B 27/42 (20060101); G03F 7/20 (20060101); G03B 027/42 (); G03B 027/68 ()

Expiration Date: 01/02016