Patent Number: 6,762,424

Title: Plasma generation

Abstract: A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.

Inventors: Wester; Neil (Tempe, AZ)

Assignee: Intel Corporation

International Classification: H01J 61/04 (20060101); H05H 1/26 (20060101); H05H 1/34 (20060101); H05H 001/34 ()

Expiration Date: 07/13/2021