Patent Number: 6,794,665

Title: Electron beam drawing apparatus

Abstract: An electron beam drawing apparatus has a sample chamber having a bottom plate, a side wall, and a top plate. Pillar members are disposed at four corners of the sample chamber and a frame is fixed to the pillar members. A plurality of supporting apparatuses for positioning a column mounted on the top plate to the frame are arranged around the column, thereby suppressing vibration of the column at the time of movement of a stage.

Inventors: Kurihara; Masaki (Tsuchiura, JP), Horiuchi; Toshihiko (Ushiku, JP), Fukushima; Yoshimasa (Hitachinaka, JP), Mizuochi; Masaki (Hitachinaka, JP)

Assignee: Hitachi High-Technologies Corporation

International Classification: G03F 7/20 (20060101); G03F 9/00 (20060101); G05D 3/12 (20060101); H01J 37/20 (20060101); H01L 21/027 (20060101); H01J 37/304 (20060101); H01L 21/02 (20060101); H01J 37/30 (20060101); H01J 037/20 (); H01J 037/304 ()

Expiration Date: 09/22012