Patent Number: 6,801,297

Title: Exposure condition determination system

Abstract: An exposure condition determination system and method, including a database configured to store a first information about a past exposure; and an exposure condition determination unit configured to determine an exposure condition suitable for a new mask which is newly made, based on said first information stored in said database and a second information about an exposure using said new mask. The first information includes at least one of a) a first mask information about properties of a mask used in said pas exposure; b) a first resist process information about properties of a resist process employed in said past exposure; c) an exposure condition information about an exposure condition employed in said past exposure; and d) a first aligner information about properties of an aligner.

Inventors: Nakae; Akihiro (Tokyo, JP)

Assignee: Renesas Technology Corp.

International Classification: G03B 27/42 (20060101); G03B 027/42 (); G03B 027/52 (); G03B 027/54 ()

Expiration Date: 10/05/2021