Patent Number: 6,885,009

Title: Device for influencing an electron beam

Abstract: A device for influencing an electron beam, especially a deflector unit foran electron beam lithography machine, comprises a plurality of coilformers (12b) each with a bore (16) defining a passage for the beam andeach carrying coils (18, 19) operable to generate magnetic fields fordeflecting the path of the beam when passing through the passage. Eachformer is made of a high-strength ceramic material having a high thermalconductivity and low coefficient of thermal expansion so that, withrespect to a given output of heat by the associated coils duringquasi-continuous operation for repeated beam deflection during patternwriting, the heat is dissipated at such a rate as to preclude thermalexpansion of the coils and thus avoid distortion of the magnetic fieldsgenerated by the coils.

Inventors: Tingay; John (Cambridge, GB), Raferty; Brian (Suffolk, GB), Crosland; Nigel (Cambridgeshire, GB)


International Classification: G01K 1/08 (20060101); H01L 21/02 (20060101); H01J 37/10 (20060101); H01L 21/027 (20060101); H01J 37/141 (20060101); H01J 37/147 (20060101); G01K 001/08 ()

Expiration Date: 04/26/2013