Patent Number: 6,915,665

Title: Method of inducing transmission in optical lithography preforms

Abstract: The invention provides an ultraviolet lithography method/system. Thelithography method and system include providing a below 200 nm radiationsource, providing a photolytically improved transmitting fused silicaglass lithography optical element, transmitting below 200 nm photonsthrough said photolytically improved transmitting fused silica glasslithography optical element to form a lithography pattern which is reducedand projected onto a radiation sensitive lithography printing medium toform a printed lithography pattern. Providing the photolytically improvedtransmitting fused silica glass lithography optical element includesproviding a photolytically improved transmitting fused silica glasslithography optical element preform body and forming the photolyticallyimproved transmitting fused silica glass lithography optical elementpreform into said lithography optical element.

Inventors: Borrelli; Nicholas F. (Elmira, NY), Danielson; Paul S. (Corning, NY), Heslin; Michael R. (Elmira, NY), Logunov; Stephan L. (Corning, NY), Moll; Johannes (Painted Post, NY), Schermerhorn; Paul M. (Painted Post, NY), Smith; Charlene M. (Corning, NY)

Assignee:

International Classification: C03B 19/00 (20060101); C03B 19/14 (20060101); C03C 23/00 (20060101); G02B 13/14 (20060101); G03F 7/20 (20060101); C03C 027/00 ()

Expiration Date: 07/12/2013