Patent Number: 6,945,851

Title: CMP formulations

Abstract: CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.

Inventors: Ward; Doug (Santa Ana, CA), Solomos; David (Yorba Linda, CA)

Assignee: Saint-Gobain Ceramics & Plastics, Inc.

International Classification: C09K 3/14 (20060101); C09G 1/02 (20060101); C09G 1/00 (20060101); B24B 001/00 ()

Expiration Date: 9/20/02017