Patent Number: 7,042,159

Title: Plasma reactor and purification equipment

Abstract: In the plasma reactor of the present invention, streamer discharge is caused in a wide region so as to increase a plasma generation region without complicating the architecture of the plasma reactor and increasing the cost. In the plasma reactor of the invention, a needle-shaped first electrode and a plate-shaped second electrode are disposed to oppose and to be perpendicular to each other, and the first electrode has a pointed portion as the end thereof on the side of the second electrode and the pointed portion has a point angle .theta. not less than 30 degrees and not more than 90 degrees, and preferably not less than 60 degrees and not more than 90 degrees.

Inventors: Tanaka; Toshio (Osaka, JP), Motegi; Kanji (Osaka, JP), Kagawa; Kenkichi (Osaka, JP), Ohkubo; Toshikazu (Oita, JP)

Assignee: Daikin Industries, Ltd.

International Classification: H01J 7/24 (20060101); H05B 31/26 (20060101)

Expiration Date: 5/09/02018