Patent Number: 7,042,576

Title: Positioning stage device

Abstract: A high speed, wide-range, high-accuracy positioning stage device for eliminating errors due to deterministic elements such as variation of surface machining accuracy of a bar mirror and for preventing error accumulation due to indeterminate elements such as air fluctuations when switching between laser interferometers. When an X1 laser interferometer as a first position measurement device and an X2 laser interferometer as a second position measurement device are switched, at a place at which at least two position measurement devices are activated, when a value is handed over from the X1 laser interferometer, which was activated, to the X2 laser interferometer, which is to be activated, errors due to the effect of X-bar mirror flatness and air fluctuations are found by a correction function for the X-bar mirror and/or a table and the average of the measured values, and the value of the X2 laser interferometer is corrected by a correction device such as a calculation device.

Inventors: Hattori; Tadashi (Tochigi, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G01B 11/02 (20060101)

Expiration Date: 5/09/02018