Patent Number: 7,078,691

Title: Standard reference for metrology and calibration method of electron-beam metrology system using the same

Abstract: The present invention is to provide a standard reference for metrology having finer reference sizes and high-precision electron-beam metrology including the same. By using a standard reference member in which a grating unit pattern of a pitch size proven by an optical diffraction angle by using a laser beam whose wavelength is absolutely guaranteed and a plurality of patterns having a finer size than that (100 nm or less) over the same substrate, fineness and correctness of calibration are made verifiable on a regular basis, and by using an electron-beam collective exposure method for pattern fabrication, fabrication of this standard reference is made possible.

Inventors: Nakayama; Yoshinori (Sayama, JP)

Assignee: Hitachi High-Technologies Corporation

International Classification: H01J 37/304 (20060101)

Expiration Date: 7/18/02018