Patent Number: 7,084,957

Title: Scanning exposure technique

Abstract: An exposure apparatus for exposing a substrate to light via a pattern of an original while the original and the substrate are scanned. The apparatus includes a stage configured to hold the substrate and to move, a projection optical system configured to project the pattern of the original onto the substrate, a measurement unit configured to measure a positional deviation between superposition marks formed on the substrate, and a controller configured to control operation of projection of a slit shot pattern of an original onto plural areas of a substrate, with each area partially overlapping four of the plural areas adjacent to each other. The projection is performed by keeping the original stand still and moving the stage, to cause the measurement unit to perform measurement of a positional deviation between superposition marks in each of the overlapping areas formed through the projection, and to control movement of the stage based on the measurement.

Inventors: Fukagawa; Youzou (Tochigi, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03B 27/42 (20060101); G03B 27/52 (20060101)

Expiration Date: 8/01/02018