Patent Number: 7,084,960

Title: Lithography using controlled polarization

Abstract: Lithography using controlled polarization. One aspect generates an electromagnetic radiation suitable for production of microelectronic devices, linearly polarizes at least a portion of the radiation at a pupil plane of a projection system to form linearly polarized radiation, and exposing a substrate using the linearly polarized radiation at a high exposure angle.

Inventors: Schenker; Richard (Portland, OR), Huggins; Kevin (Hillsboro, OR)

Assignee: Intel Corporation

International Classification: G03B 27/72 (20060101); G03B 27/42 (20060101); G03B 27/54 (20060101)

Expiration Date: 8/01/02018