Patent Number:
7,084,960
Title:
Lithography using controlled polarization
Abstract:
Lithography using controlled polarization. One aspect generates an electromagnetic radiation suitable for production of microelectronic devices, linearly polarizes at least a portion of the radiation at a pupil plane of a projection system to form linearly polarized radiation, and exposing a substrate using the linearly polarized radiation at a high exposure angle.
Inventors:
Schenker; Richard (Portland, OR), Huggins; Kevin (Hillsboro, OR)
Assignee:
Intel Corporation
International Classification:
G03B 27/72 (20060101); G03B 27/42 (20060101); G03B 27/54 (20060101)
Expiration Date:
8/01/02018